sentronics metrology


1st January, 1970

sentronics metrology

sentronics metrology GmbH was founded in 2006. It is located in
Mannheim, Germany, close to Frankfurt Airport. The company’s
technology is based on optical interferometry, which is used
to measure any kind of nanometer or micrometer topology in
semiconductor manufacturing processes. Applications are multilayer
and film thickness, wafer surface roughness and flatness, geometric
dimensioning of wafer surface irregularities and 3D micro structures.
sentronics has developed multiple optical sensors that can be
combined and integrated into one ‘Wafer Metrology Center’ called
SemDex to run all of these applications in one metrology machine
either semi-automated or fully automated. These Wafer Metrology
Centers are part of the wafer manufacturing process for all IC
product types, and established worldwide in foundries and fabs for
memory and logic, analogue, and MEMS devices and IC packaging.

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